Who uses Tempress deposition & diffusion solutions?

Our markets. Tempress deposition and diffusion solutions are used by leading companies in the semiconductor and advanced materials industry. Applications range from wafer manufacturing to MEMS, optoelectronic chip and power semiconductor production.

What types of diffusion processes does Tempress offer?

Tempress offers a wide range of diffusion processes from high temperature annealing (up to 1365°C ), wet and dry oxidation and Phosphorus and Boron doping with POCI 3 and BBr 3, to lower temperature (<500°C) sintering, alloying and annealing with up to 100% H 2. Deposition.

Where is Tempress located?

Our technologies and products have advanced the semiconductor industry and we have installed more than 30 GW production capacity in diffusion furnace systems for solar panel production. Tempress’ headquarters and assembly and testing facilities are located in Vaassen, The Netherlands.

What is Tempress TS series V?

Tempress offers a multipurpose thermal processing platform that enables you to use a wide range of (semiconductor) diffusion and deposition technologies. The horizontal furnace TS series V is optimized for flexibility, multiple processes and cleanroom space.

What does Tempress do?

About Tempress. Tempress’ purpose is to support customers in the semiconductors, power, MEMS, photonics, solar, life sciences and coating markets to produce advanced materials and devices with high added value innovative furnace solutions.

Why should you choose SVCs Difusion furnaces for phosphorus / boron doping?

The design of the SVCS difusion furnaces for Phosphorus / Boron doping combines excellent process results with the needs of a maximum capacity for full-production system, as well as high flexibility for small-scale versions to be used for PV research and pilot production.